Christian Mitterer

Research output

  1. Published

    Origins of microstructure and stress gradients in nanocrystalline thin films: The role of growth parameters and self-organization

    Daniel, R., Keckes, J., Matko, I., Burghammer, M. & Mitterer, C., 2013, In: Acta materialia. 61, p. 6255-6266

    Research output: Contribution to journalArticleResearchpeer-review

  2. Published

    Oxidation and diffusion processes during annealing of AlCrVN hard coatings

    Franz, R., Neidhardt, J., Mitterer, C., Schaffer, B., Hutter, H., Kaindl, R., Sartory, B., Tessadri, R., Lechthaler, M. & Polcik, P., 2008, In: Journal of vacuum science & technology / A (JVST). A26, p. 302-308

    Research output: Contribution to journalArticleResearchpeer-review

  3. Published

    Oxidation and diffusion study on AlCrVN hard coatings using oxygen isotopes 16O and 18O

    Franz, R., Schnöller, J., Hutter, H. & Mitterer, C., 2010.

    Research output: Contribution to conferencePosterResearchpeer-review

  4. Published

    Oxidation and diffusion study on AlCrVN hard coatings using oxygen isotopes 16O and 18O

    Franz, R., Schnöller, J., Hutter, H. & Mitterer, C., 2011, In: Thin solid films. 519, p. 3974-3981

    Research output: Contribution to journalArticleResearchpeer-review

  5. Published

    Oxidation and wet-etching behavior of MoAlTi thin films deposited by sputtering from a rotatable MoAlTi compound target

    Lorenz, R., O`Sullivan, M., Sprenger, D., Lang, B., Köstenbauer, H., Winkler, J. & Mitterer, C., 5 Feb 2019, In: Journal of vacuum science & technology / B (JVST). 37.2019, 2, 021202.

    Research output: Contribution to journalArticleResearchpeer-review

  6. Published

    Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

    Jörg, T., Hofer-Roblyek, A. M., Köstenbauer, H., Winkler, J. & Mitterer, C., 2018, In: Journal of vacuum science & technology / A (JVST). 36, p. 021513-1-021513-5

    Research output: Contribution to journalArticleResearchpeer-review

  7. Published

    Oxidation and wet etching behavior of sputtered ternary molybdenum films

    Jörg, T., Hofer-Roblyek, A. M., Winkler, J., Mitterer, C. & Köstenbauer, H., 2014.

    Research output: Contribution to conferencePresentationResearch

  8. Published

    Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

    Tritremmel, C., Daniel, R., Mitterer, C., Mayrhofer, P. H., Lechthaler, M. & Polcik, P., 2012, In: Journal of vacuum science & technology / A (JVST). 30, p. 061501-1-061501-6

    Research output: Contribution to journalArticleResearchpeer-review

  9. Published

    Oxidation behaviour and tribological properties of arc-evaporated ZrAlN hard coatings

    Franz, R., Lechthaler, M., Polcik, P. & Mitterer, C., 2012, In: Surface & coatings technology. 206, p. 2337-2345

    Research output: Contribution to journalArticleResearchpeer-review

  10. E-pub ahead of print

    Oxidation mechanism of sputter deposited model SiNx/TiN/SiNx coatings

    Moritz, Y., Kainz, C., Peritsch, P., Mitterer, C. & Schalk, N., 26 Jun 2023, (E-pub ahead of print) In: Surface and Coatings Technology. 468.2023, 15 September, 7 p., 129753.

    Research output: Contribution to journalArticleResearchpeer-review