Interfacial coherency stress distribution in TiN/AlN bilayer and multilayer films studied by FEM analysis
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Interfacial coherency stress distribution in TiN/AlN bilayer and multilayer films studied by FEM analysis. / Chawla, Vipin; Holec, David; Mayrhofer, Paul Heinz.
in: Computational materials science, Jahrgang 55, 2012, S. 211-216.
in: Computational materials science, Jahrgang 55, 2012, S. 211-216.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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Chawla V, Holec D, Mayrhofer PH. Interfacial coherency stress distribution in TiN/AlN bilayer and multilayer films studied by FEM analysis. Computational materials science. 2012;55:211-216. doi: 10.1016/j.commatsci.2011.11.024
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@article{a6ccb28f34974e898d52b18ca3951fb8,
title = "Interfacial coherency stress distribution in TiN/AlN bilayer and multilayer films studied by FEM analysis",
author = "Vipin Chawla and David Holec and Mayrhofer, {Paul Heinz}",
year = "2012",
doi = "10.1016/j.commatsci.2011.11.024",
language = "English",
volume = "55",
pages = "211--216",
journal = "Computational materials science",
issn = "0927-0256",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Interfacial coherency stress distribution in TiN/AlN bilayer and multilayer films studied by FEM analysis
AU - Chawla, Vipin
AU - Holec, David
AU - Mayrhofer, Paul Heinz
PY - 2012
Y1 - 2012
U2 - 10.1016/j.commatsci.2011.11.024
DO - 10.1016/j.commatsci.2011.11.024
M3 - Article
VL - 55
SP - 211
EP - 216
JO - Computational materials science
JF - Computational materials science
SN - 0927-0256
ER -
