Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

Research output: Contribution to conferencePosterResearchpeer-review

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Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Holec, David; Rachbauer, Richard; Lattemann, M. et al.
2012. Poster session presented at 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Research output: Contribution to conferencePosterResearchpeer-review

Harvard

Holec, D, Rachbauer, R, Lattemann, M, Hultman, L, Paulitsch, J & Mayrhofer, PH 2012, 'Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films', 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan, 4/03/12 - 8/03/12.

APA

Holec, D., Rachbauer, R., Lattemann, M., Hultman, L., Paulitsch, J., & Mayrhofer, P. H. (2012). Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. Poster session presented at 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Vancouver

Holec D, Rachbauer R, Lattemann M, Hultman L, Paulitsch J, Mayrhofer PH. Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. 2012. Poster session presented at 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Author

Holec, David ; Rachbauer, Richard ; Lattemann, M. et al. / Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. Poster session presented at 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Bibtex - Download

@conference{c6b465ba5e5d4f2dac4a2e5873d0d846,
title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",
author = "David Holec and Richard Rachbauer and M. Lattemann and L. Hultman and J{\"o}rg Paulitsch and Mayrhofer, {Paul Heinz}",
year = "2012",
language = "English",
note = "4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials ; Conference date: 04-03-2012 Through 08-03-2012",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

AU - Holec, David

AU - Rachbauer, Richard

AU - Lattemann, M.

AU - Hultman, L.

AU - Paulitsch, Jörg

AU - Mayrhofer, Paul Heinz

PY - 2012

Y1 - 2012

M3 - Poster

T2 - 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials

Y2 - 4 March 2012 through 8 March 2012

ER -