Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
Research output: Contribution to conference › Poster › Research › peer-review
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| Translated title of the contribution | Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films |
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| Original language | English |
| Publication status | Published - 2012 |
| Event | 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials - Aichi, Japan Duration: 4 Mar 2012 → 8 Mar 2012 |
Conference
| Conference | 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials |
|---|---|
| Country/Territory | Japan |
| City | Aichi |
| Period | 4/03/12 → 8/03/12 |
