Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Standard
Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Holec, David; Rachbauer, Richard; Lattemann, M. et al.
2012. Postersitzung präsentiert bei 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.
2012. Postersitzung präsentiert bei 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Harvard
Holec, D, Rachbauer, R, Lattemann, M, Hultman, L, Paulitsch, J & Mayrhofer, PH 2012, 'Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films', 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan, 4/03/12 - 8/03/12.
APA
Holec, D., Rachbauer, R., Lattemann, M., Hultman, L., Paulitsch, J., & Mayrhofer, P. H. (2012). Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. Postersitzung präsentiert bei 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.
Vancouver
Holec D, Rachbauer R, Lattemann M, Hultman L, Paulitsch J, Mayrhofer PH. Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. 2012. Postersitzung präsentiert bei 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.
Author
Bibtex - Download
@conference{c6b465ba5e5d4f2dac4a2e5873d0d846,
title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",
author = "David Holec and Richard Rachbauer and M. Lattemann and L. Hultman and J{\"o}rg Paulitsch and Mayrhofer, {Paul Heinz}",
year = "2012",
language = "English",
note = "4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials ; Conference date: 04-03-2012 Through 08-03-2012",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
AU - Holec, David
AU - Rachbauer, Richard
AU - Lattemann, M.
AU - Hultman, L.
AU - Paulitsch, Jörg
AU - Mayrhofer, Paul Heinz
PY - 2012
Y1 - 2012
M3 - Poster
T2 - 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
Y2 - 4 March 2012 through 8 March 2012
ER -
