Thin solid films, ‎0040-6090

Journal

ISSNs0040-6090
11 - 20 out of 83Page size: 10

Research output

  1. Published

    Extracting high-temperature stress–strain curves from a 1.2 μm silicon film using spherical nanoindentation

    Schaffar, G. J. K., Tscharnuter, D., Imrich, P. J. & Maier-Kiener, V., 27 Dec 2024, In: Thin solid films. 809.2025, 1 January, 10 p., 140597.

    Research output: Contribution to journal › Article › Research › peer-review

  2. Published

    Thermal expansion of magnetron sputtered TiCxN1-x coatings studied by high-temperature X-ray diffraction

    Saringer, C., Kickinger, C., Munnik, F., Mitterer, C., Schalk, N. & Tkadletz, M., 31 Oct 2019, In: Thin solid films. 688.2019, 31 October, 8 p., 137307.

    Research output: Contribution to journal › Article › Research › peer-review

  3. E-pub ahead of print

    Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

    Saghaeian, F., Keckes, J., Woehlert, S., Rosenthal, M., Reisinger, M. & Todt, J., 14 Oct 2019, (E-pub ahead of print) In: Thin solid films. 691.2019, 1 December, 7 p., 137576.

    Research output: Contribution to journal › Article › Research › peer-review

  4. Published

    Influence of oxygen impurities on growth morphology, structure and mechanical properties of Ti–Al–N thin films

    Riedl, H., Munnik, F., Hutter, H., Mendez Martin, F., Kolozsvari, S., Bartosik, M., Mayrhofer, P. H., Koller, C. & Rachbauer, R., 2016, In: Thin solid films. 603, p. 39-49 10 p.

    Research output: Contribution to journal › Article › Research › peer-review

  5. Published

    Structure and Properties of Pulsed-Laser Deposited Carbon Nitride Thin Films

    Riascos, H., Neidhardt, J., Radnoczi, G. Z., Emmerlich, J., Zambrano, G., Hultman, L. & Prieto, P., 2006, In: Thin solid films. 497, p. 1-6

    Research output: Contribution to journal › Article › Research › peer-review

  6. Published

    Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures

    Rebelo De Figueiredo, M., Abad, M. D., Harris, A. J., Czettl, C., Mitterer, C. & Hosemann, P., 2015, In: Thin solid films. 578, p. 20-24

    Research output: Contribution to journal › Article › Research › peer-review

  7. Published

    Studies on the morphology of Al2O3 thin films grown by Atomic Layer Epitaxy

    Prohaska, T., Ritala, M., Saloniemi, H., Leskelä, M. & FRIEDBACHER, G., 1996, In: Thin solid films. p. 54-58

    Research output: Contribution to journal › Article › Research › peer-review

  8. Published

    Development of crystallinity and morphology in hafnium dioxide thin films grown by Atomic Layer Epitaxy

    Prohaska, T., Ritala, M., Leskelä, M., Niinistö, L., FRIEDBACHER, G. & GRASSERBAUER, M., 1994, In: Thin solid films. p. 72-80

    Research output: Contribution to journal › Article › Research › peer-review

  9. Published

    Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films

    Prohaska, T., Ritala, M., Leskelä, M., Niinistö, L., FRIEDBACHER, G. & GRASSERBAUER, M., 1994, In: Thin solid films. p. 155-162

    Research output: Contribution to journal › Article › Research › peer-review

  10. Published

    Seed layer stimulated growth of crystalline high Al containing (Al,Cr)2O3 coatings deposited by cathodic arc evaporation

    Pohler, M., Franz, R., Ramm, J., Polcik, P. & Mitterer, C., 2014, In: Thin solid films. 550, p. 95-104

    Research output: Contribution to journal › Article › Research › peer-review

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