Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Stefan Woehlert
  • M. Rosenthal
  • M. Reisinger
  • J. Todt

External Organisational units

  • Infineon Technologies AG Austria
  • ESRF
  • KAI - Kompetenzzentrum Automobil- und Industrieelektronik GmbH
  • Erich Schmid Institute of Materials Science

Details

Original languageEnglish
Article number137576
Number of pages7
JournalThin solid films
Volume691.2019
Issue number1 December
DOIs
Publication statusE-pub ahead of print - 14 Oct 2019