Thin solid films, 0040-6090
Journal
ISSNs | 0040-6090 |
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Research output
- Published
Surface planarization and masked ion-beam structuring of YBa2Cu3O7 thin films
Pedarnig, J. D., Siraj, K., Bodea, M. A., Puica, I., Lang, W., Kolarova, R., Bauer, P., Haselgrübler, K., Hasenfuss, C., Beinik, I. & Teichert, C., 2010, In: Thin solid films. 518, p. 7075-7080Research output: Contribution to journal › Article › Research › peer-review
- Published
Effect of wavelength modulation of arc evaporated Ti-Al-N/Ti-Al-V-N multilayer coatings on microstructure and mechanical/tribological properties
Pfeiler-Deutschmann, M., Mayrhofer, P. H., Chladil, K., Penoy, M., Michotte, C., Kathrein, M. & Mitterer, C., 1 Jan 2015, In: Thin solid films. 581, p. 20-24 5 p.Research output: Contribution to journal › Article › Research › peer-review
- Published
Molecular alignments in sexiphenyl thin films epitaxially grown on muscovite
Plank, H., Resel, R., Sitter, H., Andreev, A., Sariciftci, N. S., Hlawacek, G., Teichert, C., Thierry, A. & Lotz, B., 2003, In: Thin solid films. 443, p. 108-114Research output: Contribution to journal › Article › Research › peer-review
- Published
Seed layer stimulated growth of crystalline high Al containing (Al,Cr)2O3 coatings deposited by cathodic arc evaporation
Pohler, M., Franz, R., Ramm, J., Polcik, P. & Mitterer, C., 2014, In: Thin solid films. 550, p. 95-104Research output: Contribution to journal › Article › Research › peer-review
- Published
Studies on the morphology of Al2O3 thin films grown by Atomic Layer Epitaxy
Prohaska, T., Ritala, M., Saloniemi, H., Leskelä, M. & FRIEDBACHER, G., 1996, In: Thin solid films. p. 54-58Research output: Contribution to journal › Article › Research › peer-review
- Published
Development of crystallinity and morphology in hafnium dioxide thin films grown by Atomic Layer Epitaxy
Prohaska, T., Ritala, M., Leskelä, M., Niinistö, L., FRIEDBACHER, G. & GRASSERBAUER, M., 1994, In: Thin solid films. p. 72-80Research output: Contribution to journal › Article › Research › peer-review
- Published
Surface roughness reduction in Atomic Layer Epitaxy growth of titanium dioxide thin films
Prohaska, T., Ritala, M., Leskelä, M., Niinistö, L., FRIEDBACHER, G. & GRASSERBAUER, M., 1994, In: Thin solid films. p. 155-162Research output: Contribution to journal › Article › Research › peer-review
- Published
Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures
Rebelo De Figueiredo, M., Abad, M. D., Harris, A. J., Czettl, C., Mitterer, C. & Hosemann, P., 2015, In: Thin solid films. 578, p. 20-24Research output: Contribution to journal › Article › Research › peer-review
- Published
Structure and Properties of Pulsed-Laser Deposited Carbon Nitride Thin Films
Riascos, H., Neidhardt, J., Radnoczi, G. Z., Emmerlich, J., Zambrano, G., Hultman, L. & Prieto, P., 2006, In: Thin solid films. 497, p. 1-6Research output: Contribution to journal › Article › Research › peer-review
- Published
Influence of oxygen impurities on growth morphology, structure and mechanical properties of Ti–Al–N thin films
Riedl, H., Munnik, F., Hutter, H., Mendez Martin, F., Kolozsvari, S., Bartosik, M., Mayrhofer, P. H., Koller, C. & Rachbauer, R., 2016, In: Thin solid films. 603, p. 39-49 10 p.Research output: Contribution to journal › Article › Research › peer-review