X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
in: Journal of applied crystallography, Jahrgang 49, 2016, S. 182-187.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
APA
Vancouver
Author
Bibtex - Download
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via
AU - Todt, J.
AU - Hammer, H.
AU - Sartory, B.
AU - Burghammer, M.
AU - Kraft, J.
AU - Daniel, R.
AU - Keckes, J.
AU - Defregger, S.
N1 - cited By 1
PY - 2016
Y1 - 2016
U2 - 10.1107/S1600576715023419
DO - 10.1107/S1600576715023419
M3 - Article
VL - 49
SP - 182
EP - 187
JO - Journal of applied crystallography
JF - Journal of applied crystallography
SN - 0021-8898
ER -