X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via
Research output: Contribution to journal › Article › Research › peer-review
Standard
X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via. / Todt, J.; Hammer, H.; Sartory, B. et al.
In: Journal of applied crystallography, Vol. 49, 2016, p. 182-187.
In: Journal of applied crystallography, Vol. 49, 2016, p. 182-187.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Todt, J, Hammer, H, Sartory, B, Burghammer, M, Kraft, J, Daniel, R, Keckes, J & Defregger, S 2016, 'X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via', Journal of applied crystallography, vol. 49, pp. 182-187. https://doi.org/10.1107/S1600576715023419
APA
Todt, J., Hammer, H., Sartory, B., Burghammer, M., Kraft, J., Daniel, R., Keckes, J., & Defregger, S. (2016). X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via. Journal of applied crystallography, 49, 182-187. https://doi.org/10.1107/S1600576715023419
Vancouver
Todt J, Hammer H, Sartory B, Burghammer M, Kraft J, Daniel R et al. X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via. Journal of applied crystallography. 2016;49:182-187. doi: 10.1107/S1600576715023419
Author
Bibtex - Download
@article{f52baf10c55a41f7b6f910ce017e31ab,
title = "X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via",
author = "J. Todt and H. Hammer and B. Sartory and M. Burghammer and J. Kraft and R. Daniel and J. Keckes and S. Defregger",
note = "cited By 1",
year = "2016",
doi = "10.1107/S1600576715023419",
language = "Undefined/Unknown",
volume = "49",
pages = "182--187",
journal = "Journal of applied crystallography",
issn = "0021-8898",
publisher = "International Union of Crystallography",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via
AU - Todt, J.
AU - Hammer, H.
AU - Sartory, B.
AU - Burghammer, M.
AU - Kraft, J.
AU - Daniel, R.
AU - Keckes, J.
AU - Defregger, S.
N1 - cited By 1
PY - 2016
Y1 - 2016
U2 - 10.1107/S1600576715023419
DO - 10.1107/S1600576715023419
M3 - Article
VL - 49
SP - 182
EP - 187
JO - Journal of applied crystallography
JF - Journal of applied crystallography
SN - 0021-8898
ER -
