Resolving depth evolution of microstructure and hardness in sputtered CrN film

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Resolving depth evolution of microstructure and hardness in sputtered CrN film. / Zeilinger, Angelika; Daniel, Rostislav; Schöberl, Thomas et al.
in: Thin solid films, Jahrgang 581.2015, Nr. April, 06.11.2014, S. 75-79.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Vancouver

Zeilinger A, Daniel R, Schöberl T, Stefenelli M, Sartory B, Keckes J et al. Resolving depth evolution of microstructure and hardness in sputtered CrN film. Thin solid films. 2014 Nov 6;581.2015(April):75-79. doi: 10.1016/j.tsf.2014.10.106

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@article{91b993b3fca54a37b2e29d8ec7b22d08,
title = "Resolving depth evolution of microstructure and hardness in sputtered CrN film",
abstract = "Hardness and elastic modulus of a sputtered nanocrystalline CrN thin film, prepared under varying ion bombardment conditions, were studied by nanoindentation using a depth-profiling technique and related to cross-sectional X-ray nanodiffraction data on the local microstructure. Changes in texture are shown to have almost no effect on the elastic modulus due to the isotropic response of the polycrystals. However, the locally varying growth conditions, which affect the crystal size and the number of defects in the film, determine the hardness values across the film thickness. Regions with highly distorted small crystals result in higher hardness in comparison with those with well-developed coarsened grains. This study confirms the notion of the existence of growth-related hardness gradients in single-phase nanocrystalline thin films.",
author = "Angelika Zeilinger and Rostislav Daniel and Thomas Sch{\"o}berl and Mario Stefenelli and Bernhard Sartory and Jozef Keckes and Christian Mitterer",
year = "2014",
month = nov,
day = "6",
doi = "10.1016/j.tsf.2014.10.106",
language = "English",
volume = "581.2015",
pages = "75--79",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier B.V.",
number = "April",

}

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TY - JOUR

T1 - Resolving depth evolution of microstructure and hardness in sputtered CrN film

AU - Zeilinger, Angelika

AU - Daniel, Rostislav

AU - Schöberl, Thomas

AU - Stefenelli, Mario

AU - Sartory, Bernhard

AU - Keckes, Jozef

AU - Mitterer, Christian

PY - 2014/11/6

Y1 - 2014/11/6

N2 - Hardness and elastic modulus of a sputtered nanocrystalline CrN thin film, prepared under varying ion bombardment conditions, were studied by nanoindentation using a depth-profiling technique and related to cross-sectional X-ray nanodiffraction data on the local microstructure. Changes in texture are shown to have almost no effect on the elastic modulus due to the isotropic response of the polycrystals. However, the locally varying growth conditions, which affect the crystal size and the number of defects in the film, determine the hardness values across the film thickness. Regions with highly distorted small crystals result in higher hardness in comparison with those with well-developed coarsened grains. This study confirms the notion of the existence of growth-related hardness gradients in single-phase nanocrystalline thin films.

AB - Hardness and elastic modulus of a sputtered nanocrystalline CrN thin film, prepared under varying ion bombardment conditions, were studied by nanoindentation using a depth-profiling technique and related to cross-sectional X-ray nanodiffraction data on the local microstructure. Changes in texture are shown to have almost no effect on the elastic modulus due to the isotropic response of the polycrystals. However, the locally varying growth conditions, which affect the crystal size and the number of defects in the film, determine the hardness values across the film thickness. Regions with highly distorted small crystals result in higher hardness in comparison with those with well-developed coarsened grains. This study confirms the notion of the existence of growth-related hardness gradients in single-phase nanocrystalline thin films.

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-84926255740&partnerID=MN8TOARS

U2 - 10.1016/j.tsf.2014.10.106

DO - 10.1016/j.tsf.2014.10.106

M3 - Article

VL - 581.2015

SP - 75

EP - 79

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

IS - April

ER -