Oxidation behavior of arc evaporated Al-Cr-Si-N thin films
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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Oxidation behavior of arc evaporated Al-Cr-Si-N thin films. / Tritremmel, Christian; Daniel, Rostislav; Mitterer, Christian et al.
in: Journal of vacuum science & technology / A (JVST), Jahrgang 30, 2012, S. 061501-1-061501-6.
in: Journal of vacuum science & technology / A (JVST), Jahrgang 30, 2012, S. 061501-1-061501-6.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Tritremmel, C, Daniel, R, Mitterer, C, Mayrhofer, PH, Lechthaler, M & Polcik, P 2012, 'Oxidation behavior of arc evaporated Al-Cr-Si-N thin films', Journal of vacuum science & technology / A (JVST), Jg. 30, S. 061501-1-061501-6.
APA
Tritremmel, C., Daniel, R., Mitterer, C., Mayrhofer, P. H., Lechthaler, M., & Polcik, P. (2012). Oxidation behavior of arc evaporated Al-Cr-Si-N thin films. Journal of vacuum science & technology / A (JVST), 30, 061501-1-061501-6.
Vancouver
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Bibtex - Download
@article{01be233d20944ef8af23639a6abd50bb,
title = "Oxidation behavior of arc evaporated Al-Cr-Si-N thin films",
author = "Christian Tritremmel and Rostislav Daniel and Christian Mitterer and Mayrhofer, {Paul Heinz} and Markus Lechthaler and Peter Polcik",
year = "2012",
language = "English",
volume = "30",
pages = "061501--1--061501--6",
journal = "Journal of vacuum science & technology / A (JVST)",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Oxidation behavior of arc evaporated Al-Cr-Si-N thin films
AU - Tritremmel, Christian
AU - Daniel, Rostislav
AU - Mitterer, Christian
AU - Mayrhofer, Paul Heinz
AU - Lechthaler, Markus
AU - Polcik, Peter
PY - 2012
Y1 - 2012
M3 - Article
VL - 30
SP - 061501-1-061501-6
JO - Journal of vacuum science & technology / A (JVST)
JF - Journal of vacuum science & technology / A (JVST)
SN - 0734-2101
ER -
