Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

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Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. / Saghaeian, Fahimeh; Keckes, Jozef; Woehlert, Stefan et al.
in: Thin solid films, Jahrgang 691.2019, Nr. 1 December, 137576, 14.10.2019.

Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)

Harvard

Saghaeian, F, Keckes, J, Woehlert, S, Rosenthal, M, Reisinger, M & Todt, J 2019, 'Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy', Thin solid films, Jg. 691.2019, Nr. 1 December, 137576. https://doi.org/10.1016/j.tsf.2019.137576

APA

Saghaeian, F., Keckes, J., Woehlert, S., Rosenthal, M., Reisinger, M., & Todt, J. (2019). Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. Thin solid films, 691.2019(1 December), Artikel 137576. Vorzeitige Online-Publikation. https://doi.org/10.1016/j.tsf.2019.137576

Vancouver

Saghaeian F, Keckes J, Woehlert S, Rosenthal M, Reisinger M, Todt J. Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. Thin solid films. 2019 Okt 14;691.2019(1 December):137576. Epub 2019 Okt 14. doi: 10.1016/j.tsf.2019.137576

Author

Saghaeian, Fahimeh ; Keckes, Jozef ; Woehlert, Stefan et al. / Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy. in: Thin solid films. 2019 ; Jahrgang 691.2019, Nr. 1 December.

Bibtex - Download

@article{73e2be12f03c4419ad6c7819ec3add18,
title = "Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy",
keywords = "Internal stress, Residual stress, Thin film, Titanium tungsten, Diffusion barrier, X-ray nanodiffraction",
author = "Fahimeh Saghaeian and Jozef Keckes and Stefan Woehlert and M. Rosenthal and M. Reisinger and J. Todt",
year = "2019",
month = oct,
day = "14",
doi = "10.1016/j.tsf.2019.137576",
language = "English",
volume = "691.2019",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1 December",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

AU - Saghaeian, Fahimeh

AU - Keckes, Jozef

AU - Woehlert, Stefan

AU - Rosenthal, M.

AU - Reisinger, M.

AU - Todt, J.

PY - 2019/10/14

Y1 - 2019/10/14

KW - Internal stress

KW - Residual stress

KW - Thin film

KW - Titanium tungsten, Diffusion barrier

KW - X-ray nanodiffraction

UR - http://www.scopus.com/inward/record.url?scp=85073521309&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2019.137576

DO - 10.1016/j.tsf.2019.137576

M3 - Article

AN - SCOPUS:85073521309

VL - 691.2019

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

IS - 1 December

M1 - 137576

ER -

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