High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method. / Keckes, Jozef; Eiper, E.; Martinschitz, K.J. et al.
in: Review of scientific instruments, Jahrgang 78, 2007, S. 036103-01-036103-03.
in: Review of scientific instruments, Jahrgang 78, 2007, S. 036103-01-036103-03.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Keckes, J, Eiper, E, Martinschitz, KJ, Köstenbauer, H, Daniel, R & Mitterer, C 2007, 'High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method', Review of scientific instruments, Jg. 78, S. 036103-01-036103-03. https://doi.org/10.1063/1.2535857
APA
Keckes, J., Eiper, E., Martinschitz, K. J., Köstenbauer, H., Daniel, R., & Mitterer, C. (2007). High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method. Review of scientific instruments, 78, 036103-01-036103-03. https://doi.org/10.1063/1.2535857
Vancouver
Keckes J, Eiper E, Martinschitz KJ, Köstenbauer H, Daniel R, Mitterer C. High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method. Review of scientific instruments. 2007;78:036103-01-036103-03. doi: 10.1063/1.2535857
Author
Bibtex - Download
@article{69c760115f624ab5b0920d437fae853a,
title = "High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method",
author = "Jozef Keckes and E. Eiper and K.J. Martinschitz and Harald K{\"o}stenbauer and Rostislav Daniel and Christian Mitterer",
year = "2007",
doi = "10.1063/1.2535857",
language = "English",
volume = "78",
pages = "036103--01--036103--03",
journal = "Review of scientific instruments",
issn = "0034-6748",
publisher = "American Institute of Physics Publising LLC",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
AU - Keckes, Jozef
AU - Eiper, E.
AU - Martinschitz, K.J.
AU - Köstenbauer, Harald
AU - Daniel, Rostislav
AU - Mitterer, Christian
PY - 2007
Y1 - 2007
U2 - 10.1063/1.2535857
DO - 10.1063/1.2535857
M3 - Article
VL - 78
SP - 036103-01-036103-03
JO - Review of scientific instruments
JF - Review of scientific instruments
SN - 0034-6748
ER -
