Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content
Research output: Contribution to journal › Article › Research › peer-review
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Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content. / Musil, J.; Daniel, R.; Zeman, P. et al.
In: Thin solid films, 2005.
In: Thin solid films, 2005.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Musil, J, Daniel, R, Zeman, P & Takai, O 2005, 'Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content', Thin solid films. https://doi.org/10.1016/j.tsf.2004.11.190
APA
Musil, J., Daniel, R., Zeman, P., & Takai, O. (2005). Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content. Thin solid films. https://doi.org/10.1016/j.tsf.2004.11.190
Vancouver
Musil J, Daniel R, Zeman P, Takai O. Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content. Thin solid films. 2005. doi: 10.1016/j.tsf.2004.11.190
Author
Bibtex - Download
@article{179a4064cdf24ac681e8e22645f088ed,
title = "Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content",
author = "J. Musil and R. Daniel and P. Zeman and O. Takai",
year = "2005",
doi = "10.1016/j.tsf.2004.11.190",
language = "English",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content
AU - Musil, J.
AU - Daniel, R.
AU - Zeman, P.
AU - Takai, O.
PY - 2005
Y1 - 2005
UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-14644394301&partnerID=MN8TOARS
U2 - 10.1016/j.tsf.2004.11.190
DO - 10.1016/j.tsf.2004.11.190
M3 - Article
JO - Thin solid films
JF - Thin solid films
SN - 0040-6090
ER -
