Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content

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Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content. / Musil, J.; Daniel, R.; Zeman, P. et al.
in: Thin solid films, 2005.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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@article{179a4064cdf24ac681e8e22645f088ed,
title = "Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content",
author = "J. Musil and R. Daniel and P. Zeman and O. Takai",
year = "2005",
doi = "10.1016/j.tsf.2004.11.190",
language = "English",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Structure and properties of magnetron sputtered Zr-Si-N films with a high (≥25 at.%) Si content

AU - Musil, J.

AU - Daniel, R.

AU - Zeman, P.

AU - Takai, O.

PY - 2005

Y1 - 2005

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-14644394301&partnerID=MN8TOARS

U2 - 10.1016/j.tsf.2004.11.190

DO - 10.1016/j.tsf.2004.11.190

M3 - Article

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -