Resolving depth evolution of microstructure and hardness in sputtered CrN film

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Angelika Zeilinger
  • Mario Stefenelli
  • Bernhard Sartory

External Organisational units

  • Materials Center Leoben Forschungs GmbH
  • Erich Schmid Institute of Materials Science

Abstract

Hardness and elastic modulus of a sputtered nanocrystalline CrN thin film, prepared under varying ion bombardment conditions, were studied by nanoindentation using a depth-profiling technique and related to cross-sectional X-ray nanodiffraction data on the local microstructure. Changes in texture are shown to have almost no effect on the elastic modulus due to the isotropic response of the polycrystals. However, the locally varying growth conditions, which affect the crystal size and the number of defects in the film, determine the hardness values across the film thickness. Regions with highly distorted small crystals result in higher hardness in comparison with those with well-developed coarsened grains. This study confirms the notion of the existence of growth-related hardness gradients in single-phase nanocrystalline thin films.

Details

Original languageEnglish
Pages (from-to)75-79
Number of pages5
JournalThin solid films
Volume581.2015
Issue numberApril
DOIs
Publication statusPublished - 6 Nov 2014