Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Research output: Contribution to journal › Article › Research › peer-review
Standard
Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. / Wolfberger, Archim; Petritz, Andreas; Fian, A. et al.
In: Cellulose, Vol. Volume 22, No. Issue 1, 16.10.2014, p. 717-727.
In: Cellulose, Vol. Volume 22, No. Issue 1, 16.10.2014, p. 717-727.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Wolfberger, A, Petritz, A, Fian, A, Herka, J, Schmidt, V, Stadlober, B, Kargl, R, Spirk, S & Grießer, T 2014, 'Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications', Cellulose, vol. Volume 22, no. Issue 1, pp. 717-727. https://doi.org/10.1007/s10570-014-0471-4
APA
Wolfberger, A., Petritz, A., Fian, A., Herka, J., Schmidt, V., Stadlober, B., Kargl, R., Spirk, S., & Grießer, T. (2014). Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. Cellulose, Volume 22(Issue 1), 717-727. https://doi.org/10.1007/s10570-014-0471-4
Vancouver
Wolfberger A, Petritz A, Fian A, Herka J, Schmidt V, Stadlober B et al. Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. Cellulose. 2014 Oct 16;Volume 22(Issue 1):717-727. doi: 10.1007/s10570-014-0471-4
Author
Bibtex - Download
@article{eb53db035fca4b56b08cf95319c76db7,
title = "Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications",
author = "Archim Wolfberger and Andreas Petritz and A. Fian and Jakob Herka and V. Schmidt and B. Stadlober and Rupert Kargl and Stefan Spirk and Thomas Grie{\ss}er",
year = "2014",
month = oct,
day = "16",
doi = "10.1007/s10570-014-0471-4",
language = "English",
volume = "Volume 22",
pages = "717--727",
journal = "Cellulose",
issn = "0969-0239",
publisher = "Springer Netherlands",
number = "Issue 1",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
AU - Wolfberger, Archim
AU - Petritz, Andreas
AU - Fian, A.
AU - Herka, Jakob
AU - Schmidt, V.
AU - Stadlober, B.
AU - Kargl, Rupert
AU - Spirk, Stefan
AU - Grießer, Thomas
PY - 2014/10/16
Y1 - 2014/10/16
U2 - 10.1007/s10570-014-0471-4
DO - 10.1007/s10570-014-0471-4
M3 - Article
VL - Volume 22
SP - 717
EP - 727
JO - Cellulose
JF - Cellulose
SN - 0969-0239
IS - Issue 1
ER -
