Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • Andreas Petritz
  • A. Fian
  • V. Schmidt
  • B. Stadlober
  • Rupert Kargl
  • Stefan Spirk

Details

Translated title of the contributionPhotolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Original languageEnglish
Pages (from-to)717-727
Number of pages11
JournalCellulose
VolumeVolume 22
Issue numberIssue 1
DOIs
Publication statusPublished - 16 Oct 2014