Phase stability and decomposition products of Ti-Al-Ta-N thin films

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Phase stability and decomposition products of Ti-Al-Ta-N thin films. / Rachbauer, Richard; Holec, David; Mayrhofer, Paul Heinz.
In: Applied physics letters, Vol. 97, 2010, p. 151901-1-151901-3.

Research output: Contribution to journalArticleResearchpeer-review

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@article{53e5a91871974916ab9ffdc14a790fa0,
title = "Phase stability and decomposition products of Ti-Al-Ta-N thin films",
author = "Richard Rachbauer and David Holec and Mayrhofer, {Paul Heinz}",
year = "2010",
language = "English",
volume = "97",
pages = "151901--1--151901--3",
journal = "Applied physics letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Phase stability and decomposition products of Ti-Al-Ta-N thin films

AU - Rachbauer, Richard

AU - Holec, David

AU - Mayrhofer, Paul Heinz

PY - 2010

Y1 - 2010

M3 - Article

VL - 97

SP - 151901-1-151901-3

JO - Applied physics letters

JF - Applied physics letters

SN - 0003-6951

ER -