Oxidation and wet etching behavior of sputtered ternary molybdenum films
Research output: Contribution to conference › Presentation › Research
Standard
Oxidation and wet etching behavior of sputtered ternary molybdenum films. / Jörg, Tanja; Hofer-Roblyek, Anna Maria; Winkler, Jörg et al.
2014. 14th IMID.
2014. 14th IMID.
Research output: Contribution to conference › Presentation › Research
Harvard
Jörg, T, Hofer-Roblyek, AM, Winkler, J, Mitterer, C & Köstenbauer, H 2014, 'Oxidation and wet etching behavior of sputtered ternary molybdenum films', 14th IMID, 26/08/14.
APA
Jörg, T., Hofer-Roblyek, A. M., Winkler, J., Mitterer, C., & Köstenbauer, H. (2014). Oxidation and wet etching behavior of sputtered ternary molybdenum films. 14th IMID.
Vancouver
Jörg T, Hofer-Roblyek AM, Winkler J, Mitterer C, Köstenbauer H. Oxidation and wet etching behavior of sputtered ternary molybdenum films. 2014. 14th IMID.
Author
Bibtex - Download
@conference{62f5501b29e74e698f4a231a33135223,
title = "Oxidation and wet etching behavior of sputtered ternary molybdenum films",
author = "Tanja J{\"o}rg and Hofer-Roblyek, {Anna Maria} and J{\"o}rg Winkler and Christian Mitterer and Harald K{\"o}stenbauer",
year = "2014",
language = "English",
note = "14th IMID ; Conference date: 26-08-2014",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Oxidation and wet etching behavior of sputtered ternary molybdenum films
AU - Jörg, Tanja
AU - Hofer-Roblyek, Anna Maria
AU - Winkler, Jörg
AU - Mitterer, Christian
AU - Köstenbauer, Harald
PY - 2014
Y1 - 2014
M3 - Presentation
T2 - 14th IMID
Y2 - 26 August 2014
ER -
