Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films

Research output: Contribution to journalArticleResearchpeer-review

Standard

Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films. / Teichert, Christian; Kremmer, Sascha.
In: Journal of applied physics, Vol. 97, 2005.

Research output: Contribution to journalArticleResearchpeer-review

Bibtex - Download

@article{a06b872326bf445b8f387841a2fb6cae,
title = "Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films",
author = "Christian Teichert and Sascha Kremmer",
year = "2005",
doi = "10.1063/1.1885166",
language = "English",
volume = "97",
journal = "Journal of applied physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films

AU - Teichert, Christian

AU - Kremmer, Sascha

PY - 2005

Y1 - 2005

U2 - 10.1063/1.1885166

DO - 10.1063/1.1885166

M3 - Article

VL - 97

JO - Journal of applied physics

JF - Journal of applied physics

SN - 0021-8979

ER -