Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films
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Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films. / Teichert, Christian; Kremmer, Sascha.
in: Journal of applied physics, Jahrgang 97, 2005.
in: Journal of applied physics, Jahrgang 97, 2005.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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Teichert C, Kremmer S. Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films. Journal of applied physics. 2005;97. doi: 10.1063/1.1885166
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Bibtex - Download
@article{a06b872326bf445b8f387841a2fb6cae,
title = "Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films",
author = "Christian Teichert and Sascha Kremmer",
year = "2005",
doi = "10.1063/1.1885166",
language = "English",
volume = "97",
journal = "Journal of applied physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films
AU - Teichert, Christian
AU - Kremmer, Sascha
PY - 2005
Y1 - 2005
U2 - 10.1063/1.1885166
DO - 10.1063/1.1885166
M3 - Article
VL - 97
JO - Journal of applied physics
JF - Journal of applied physics
SN - 0021-8979
ER -
