Mehrdimensional photostrukturierte Substrate auf der Grundlage von Monosaccharidderivaten, deren Oligomere und deren Polymere, und Herstellungsverfahren dafür

Research output: Patent

Authors

  • Karin Stana Kleinschek (Inventor)
  • Stefan Spirk (Inventor)
  • Rupert Kargl (Inventor)
  • Volker Ribitsch (Inventor)

External Organisational units

  • Universität Maribor
  • Institut für Mathematik und Wissenschaftliches Rechnen, Karl-Franzens-Universität Graz

Abstract

Multidimensionally photopatterned substrate on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof solves the lack of environmentally friendly photoresist compositions, and further the lack of 3-D structuring and the use of a sugar/polysaccharide derivative bearing at least two acid labile groups, the use of hydroxyalkane derivatives as such, which limits the applicability above referenced technical problem by use of silylated sugar/polysaccharide derivatives, further 3-D structuring, and use of enzymes to obtain positive and negative resists. The invention is characterized by 2- and 3-dimensionally patterned substrates composed of a photoresist composition on the basis of mono, di-, oligo and polysaccharide derivatives which bear only one type of acid labile group and a photoacid generator (hereinafter PAG) which generates an acid upon exposure to electromagnetic waves and/or charged particle beams, and/or a 2-photon sensitive PAG

Details

Translated title of the contributionMultidimensionally photopatterned substrates on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof
Original languageGerman
Patent numberEP2784586
IPCG03F 7/ 039 A I
Priority date27/03/13
Publication statusPublished - 1 Oct 2014