Mehrdimensional photostrukturierte Substrate auf der Grundlage von Monosaccharidderivaten, deren Oligomere und deren Polymere, und Herstellungsverfahren dafür
Research output: Patent
Authors
Organisational units
External Organisational units
- Universität Maribor
- Institut für Mathematik und Wissenschaftliches Rechnen, Karl-Franzens-Universität Graz
Abstract
Multidimensionally photopatterned substrate on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof solves the lack of environmentally friendly photoresist compositions, and further the lack of 3-D structuring and the use of a sugar/polysaccharide derivative bearing at least two acid labile groups, the use of hydroxyalkane derivatives as such, which limits the applicability above referenced technical problem by use of silylated sugar/polysaccharide derivatives, further 3-D structuring, and use of enzymes to obtain positive and negative resists. The invention is characterized by 2- and 3-dimensionally patterned substrates composed of a photoresist composition on the basis of mono, di-, oligo and polysaccharide derivatives which bear only one type of acid labile group and a photoacid generator (hereinafter PAG) which generates an acid upon exposure to electromagnetic waves and/or charged particle beams, and/or a 2-photon sensitive PAG
Details
Translated title of the contribution | Multidimensionally photopatterned substrates on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof |
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Original language | German |
Patent number | EP2784586 |
IPC | G03F 7/ 039 A I |
Priority date | 27/03/13 |
Publication status | Published - 1 Oct 2014 |