Mehrdimensional photostrukturierte Substrate auf der Grundlage von Monosaccharidderivaten, deren Oligomere und deren Polymere, und Herstellungsverfahren dafür
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Patent No.: EP2784586. Oct 01, 2014.
Research output: Patent
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TY - PAT
T1 - Mehrdimensional photostrukturierte Substrate auf der Grundlage von Monosaccharidderivaten, deren Oligomere und deren Polymere, und Herstellungsverfahren dafür
AU - Stana Kleinschek, Karin
AU - Spirk, Stefan
AU - Griesser, Thomas
AU - Kern, Wolfgang
AU - Kargl, Rupert
AU - Ribitsch, Volker
PY - 2014/10/1
Y1 - 2014/10/1
N2 - Multidimensionally photopatterned substrate on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof solves the lack of environmentally friendly photoresist compositions, and further the lack of 3-D structuring and the use of a sugar/polysaccharide derivative bearing at least two acid labile groups, the use of hydroxyalkane derivatives as such, which limits the applicability above referenced technical problem by use of silylated sugar/polysaccharide derivatives, further 3-D structuring, and use of enzymes to obtain positive and negative resists. The invention is characterized by 2- and 3-dimensionally patterned substrates composed of a photoresist composition on the basis of mono, di-, oligo and polysaccharide derivatives which bear only one type of acid labile group and a photoacid generator (hereinafter PAG) which generates an acid upon exposure to electromagnetic waves and/or charged particle beams, and/or a 2-photon sensitive PAG
AB - Multidimensionally photopatterned substrate on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof solves the lack of environmentally friendly photoresist compositions, and further the lack of 3-D structuring and the use of a sugar/polysaccharide derivative bearing at least two acid labile groups, the use of hydroxyalkane derivatives as such, which limits the applicability above referenced technical problem by use of silylated sugar/polysaccharide derivatives, further 3-D structuring, and use of enzymes to obtain positive and negative resists. The invention is characterized by 2- and 3-dimensionally patterned substrates composed of a photoresist composition on the basis of mono, di-, oligo and polysaccharide derivatives which bear only one type of acid labile group and a photoacid generator (hereinafter PAG) which generates an acid upon exposure to electromagnetic waves and/or charged particle beams, and/or a 2-photon sensitive PAG
M3 - Patentschrift
M1 - EP2784586
ER -
