Mehrdimensional photostrukturierte Substrate auf der Grundlage von Monosaccharidderivaten, deren Oligomere und deren Polymere, und Herstellungsverfahren dafür

Publikationen: PatentPatentschrift

Autoren

  • Karin Stana Kleinschek (Erfinder)
  • Stefan Spirk (Erfinder)
  • Rupert Kargl (Erfinder)
  • Volker Ribitsch (Erfinder)

Externe Organisationseinheiten

  • Universität Maribor
  • Universität Graz

Abstract

Multidimensionally photopatterned substrate on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof solves the lack of environmentally friendly photoresist compositions, and further the lack of 3-D structuring and the use of a sugar/polysaccharide derivative bearing at least two acid labile groups, the use of hydroxyalkane derivatives as such, which limits the applicability above referenced technical problem by use of silylated sugar/polysaccharide derivatives, further 3-D structuring, and use of enzymes to obtain positive and negative resists. The invention is characterized by 2- and 3-dimensionally patterned substrates composed of a photoresist composition on the basis of mono, di-, oligo and polysaccharide derivatives which bear only one type of acid labile group and a photoacid generator (hereinafter PAG) which generates an acid upon exposure to electromagnetic waves and/or charged particle beams, and/or a 2-photon sensitive PAG

Details

Titel in ÜbersetzungMultidimensionally photopatterned substrates on the basis of monosaccharide derivatives, their oligomers and their polymers and a method of production thereof
OriginalspracheDeutsch
VeröffentlichungsnummerEP2784586
IPCG03F 7/ 039 A I
Prioritätsdatum27/03/13
StatusVeröffentlicht - 1 Okt. 2014