High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
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| Translated title of the contribution | High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method |
|---|---|
| Original language | English |
| Pages (from-to) | 036103-01-036103-03 |
| Journal | Review of scientific instruments |
| Volume | 78 |
| DOIs | |
| Publication status | Published - 2007 |
