Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology
Research output: Contribution to journal › Article › Research › peer-review
Authors
Organisational units
External Organisational units
- Swiss Federal Laboratories for Materials Science and Technology
- Empa – Swiss Federal Laboratories for Materials Science and Technology
- CEST Centre for Electrochemistry and Surface Technology GmbH
- Institute of Applied Physics
- Institute of Materials Science and Technology
Details
| Original language | English |
|---|---|
| Article number | 113724 |
| Journal | Vacuum |
| Volume | 230 |
| DOIs | |
| Publication status | Published - Dec 2024 |
