Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

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Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Rachbauer, Richard; Holec, David; Lattemann, Martina et al.
In: International journal of materials research : IJMR ; Zeitschrift für Metallkunde, Vol. 102, 2011, p. 735-742.

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@article{9f3f4b16914b4ff995cebb182c8dcc62,
title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",
author = "Richard Rachbauer and David Holec and Martina Lattemann and Lars Hultman and Mayrhofer, {Paul Heinz}",
year = "2011",
language = "English",
volume = "102",
pages = "735--742",
journal = "International journal of materials research : IJMR ; Zeitschrift f{\"u}r Metallkunde",
issn = "1862-5282",
publisher = "Carl Hanser Verlag GmbH & Co. KG",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

AU - Rachbauer, Richard

AU - Holec, David

AU - Lattemann, Martina

AU - Hultman, Lars

AU - Mayrhofer, Paul Heinz

PY - 2011

Y1 - 2011

M3 - Article

VL - 102

SP - 735

EP - 742

JO - International journal of materials research : IJMR ; Zeitschrift für Metallkunde

JF - International journal of materials research : IJMR ; Zeitschrift für Metallkunde

SN - 1862-5282

ER -