Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
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Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Rachbauer, Richard; Holec, David; Lattemann, Martina et al.
in: International journal of materials research : IJMR ; Zeitschrift für Metallkunde, Jahrgang 102, 2011, S. 735-742.
in: International journal of materials research : IJMR ; Zeitschrift für Metallkunde, Jahrgang 102, 2011, S. 735-742.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Rachbauer, R, Holec, D, Lattemann, M, Hultman, L & Mayrhofer, PH 2011, 'Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films', International journal of materials research : IJMR ; Zeitschrift für Metallkunde, Jg. 102, S. 735-742.
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@article{9f3f4b16914b4ff995cebb182c8dcc62,
title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",
author = "Richard Rachbauer and David Holec and Martina Lattemann and Lars Hultman and Mayrhofer, {Paul Heinz}",
year = "2011",
language = "English",
volume = "102",
pages = "735--742",
journal = "International journal of materials research : IJMR ; Zeitschrift f{\"u}r Metallkunde",
issn = "1862-5282",
publisher = "Carl Hanser Verlag GmbH & Co. KG",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
AU - Rachbauer, Richard
AU - Holec, David
AU - Lattemann, Martina
AU - Hultman, Lars
AU - Mayrhofer, Paul Heinz
PY - 2011
Y1 - 2011
M3 - Article
VL - 102
SP - 735
EP - 742
JO - International journal of materials research : IJMR ; Zeitschrift für Metallkunde
JF - International journal of materials research : IJMR ; Zeitschrift für Metallkunde
SN - 1862-5282
ER -
