Effects of bias pulse frequencies on reactively sputter deposited NbOx films

Research output: Contribution to journalArticleResearchpeer-review

Authors

  • M. O`Sullivan
  • Alexander Fian
  • D. Sprenger
  • Bernhard Lang

External Organisational units

  • PLANSEE SE
  • Institute of Nanostructured Materials and Photonics, Joanneum Research

Details

Original languageEnglish
Pages (from-to)335-342
JournalThin solid films
DOIs
Publication statusPublished - 2018