Effects of bias pulse frequencies on reactively sputter deposited NbOx films
Research output: Contribution to journal › Article › Research › peer-review
Authors
Organisational units
External Organisational units
- PLANSEE SE
- Institute of Nanostructured Materials and Photonics, Joanneum Research
Details
Original language | English |
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Pages (from-to) | 335-342 |
Journal | Thin solid films |
DOIs | |
Publication status | Published - 2018 |