The origin of stresses in magnetron sputtered thin films
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Standard
The origin of stresses in magnetron sputtered thin films. / Daniel, Rostislav; Mitterer, Christian; Martinschitz, K.J. et al.
Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials. 2009. S. 44-44.
Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials. 2009. S. 44-44.
Publikationen: Beitrag in Buch/Bericht/Konferenzband › Beitrag in Konferenzband
Harvard
Daniel, R, Mitterer, C, Martinschitz, KJ & Keckes, J 2009, The origin of stresses in magnetron sputtered thin films. in Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials. S. 44-44.
APA
Daniel, R., Mitterer, C., Martinschitz, K. J., & Keckes, J. (2009). The origin of stresses in magnetron sputtered thin films. In Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials (S. 44-44)
Vancouver
Daniel R, Mitterer C, Martinschitz KJ, Keckes J. The origin of stresses in magnetron sputtered thin films. in Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials. 2009. S. 44-44
Author
Bibtex - Download
@inproceedings{cffc1631c5404a8494f83849d72ebfee,
title = "The origin of stresses in magnetron sputtered thin films",
author = "Rostislav Daniel and Christian Mitterer and K.J. Martinschitz and Jozef Keckes",
year = "2009",
language = "English",
pages = "44--44",
booktitle = "Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials",
}
RIS (suitable for import to EndNote) - Download
TY - GEN
T1 - The origin of stresses in magnetron sputtered thin films
AU - Daniel, Rostislav
AU - Mitterer, Christian
AU - Martinschitz, K.J.
AU - Keckes, Jozef
PY - 2009
Y1 - 2009
M3 - Conference contribution
SP - 44
EP - 44
BT - Proceedings of 4th International Conference on Surface, coatings and Nanostructured Materials
ER -
