Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit. / Paulitsch, Jörg; Schenkel, M.; Zufraß, Th. et al.
in: Thin solid films, Jahrgang 518, 2010, S. 5558-5564.
in: Thin solid films, Jahrgang 518, 2010, S. 5558-5564.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
Paulitsch, J, Schenkel, M, Zufraß, T, Mayrhofer, PH & Münz, W-D 2010, 'Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit', Thin solid films, Jg. 518, S. 5558-5564. https://doi.org/10.1016/j.tsf.2010.05.062
APA
Paulitsch, J., Schenkel, M., Zufraß, T., Mayrhofer, P. H., & Münz, W.-D. (2010). Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit. Thin solid films, 518, 5558-5564. https://doi.org/10.1016/j.tsf.2010.05.062
Vancouver
Paulitsch J, Schenkel M, Zufraß T, Mayrhofer PH, Münz WD. Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit. Thin solid films. 2010;518:5558-5564. doi: 10.1016/j.tsf.2010.05.062
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Bibtex - Download
@article{9bd74c5d7b3e4551988c90b671ad4610,
title = "Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit",
author = "J{\"o}rg Paulitsch and M. Schenkel and Th. Zufra{\ss} and Mayrhofer, {Paul Heinz} and W.-D. M{\"u}nz",
year = "2010",
doi = "10.1016/j.tsf.2010.05.062",
language = "English",
volume = "518",
pages = "5558--5564",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
AU - Paulitsch, Jörg
AU - Schenkel, M.
AU - Zufraß, Th.
AU - Mayrhofer, Paul Heinz
AU - Münz, W.-D.
PY - 2010
Y1 - 2010
U2 - 10.1016/j.tsf.2010.05.062
DO - 10.1016/j.tsf.2010.05.062
M3 - Article
VL - 518
SP - 5558
EP - 5564
JO - Thin solid films
JF - Thin solid films
SN - 0040-6090
ER -
