Influences of the nitrogen content on the morphological, chemical and optical properies of pulsed laser deposited silicon nitride thin films
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in: Surface & coatings technology, Jahrgang 192, 2005, S. 225-230.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Influences of the nitrogen content on the morphological, chemical and optical properies of pulsed laser deposited silicon nitride thin films
AU - Lackner, Juergen
AU - Waldhauser, Wolfgang
AU - Berghauser, R.
AU - Ebner, Reinhold
AU - Beutl, M.
AU - Jakopic, G.
AU - Leising, G.
AU - Hutter, H.
AU - Rosner, M.
AU - Schöberl, Thomas
PY - 2005
Y1 - 2005
U2 - 10.1016/j.surfcoat.2004.04.080
DO - 10.1016/j.surfcoat.2004.04.080
M3 - Article
VL - 192
SP - 225
EP - 230
JO - Surface & coatings technology
JF - Surface & coatings technology
SN - 0257-8972
ER -