Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

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Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth. / Franz, Robert; Clavero, César; Anders, André et al.
in: Plasma sources science & technology, Jahrgang 25, 2016, S. 1-11.

Publikationen: Beitrag in FachzeitschriftArtikelForschung(peer-reviewed)

Bibtex - Download

@article{6da37ff5e8e249f087f3ff3d9bf8002c,
title = "Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth",
author = "Robert Franz and C{\'e}sar Clavero and Andr{\'e} Anders and Jonathan Kolbeck",
year = "2016",
doi = "10.1088/0963-0252/25/1/015022",
language = "English",
volume = "25",
pages = "1--11",
journal = "Plasma sources science & technology",
issn = "0963-0252",
publisher = "IOP Publishing Ltd.",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth

AU - Franz, Robert

AU - Clavero, César

AU - Anders, André

AU - Kolbeck, Jonathan

PY - 2016

Y1 - 2016

U2 - 10.1088/0963-0252/25/1/015022

DO - 10.1088/0963-0252/25/1/015022

M3 - Article

VL - 25

SP - 1

EP - 11

JO - Plasma sources science & technology

JF - Plasma sources science & technology

SN - 0963-0252

ER -