Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Standard
in: Plasma sources science & technology, Jahrgang 25, 2016, S. 1-11.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
Harvard
APA
Vancouver
Author
Bibtex - Download
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth
AU - Franz, Robert
AU - Clavero, César
AU - Anders, André
AU - Kolbeck, Jonathan
PY - 2016
Y1 - 2016
U2 - 10.1088/0963-0252/25/1/015022
DO - 10.1088/0963-0252/25/1/015022
M3 - Article
VL - 25
SP - 1
EP - 11
JO - Plasma sources science & technology
JF - Plasma sources science & technology
SN - 0963-0252
ER -