Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology
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in: Vacuum, Jahrgang 230, 113724, 12.2024.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology
AU - Knabl, Florian
AU - Gutnik, Dominik
AU - Patil, Prathamesh
AU - Bandl, Christine
AU - Vermeij, Tijmen
AU - Pichler, Christian M.
AU - Putz, Barbara
AU - Mitterer, Christian
N1 - Publisher Copyright: © 2024 The Authors
PY - 2024/12
Y1 - 2024/12
KW - Low energy ion scattering spectroscopy
KW - Magnetron sputter inert gas condensation
KW - Magnetron sputtering
KW - Nanoparticle synthesis
KW - Thin film
UR - http://www.scopus.com/inward/record.url?scp=85206340376&partnerID=8YFLogxK
U2 - 10.1016/j.vacuum.2024.113724
DO - 10.1016/j.vacuum.2024.113724
M3 - Article
AN - SCOPUS:85206340376
VL - 230
JO - Vacuum
JF - Vacuum
SN - 0042-207X
M1 - 113724
ER -
