Analysis of the thermal and temporal stability of Ta and Ti thin films onto SAW–substrate materials (LiNbO3 and LiTaO3) using AR-XPS
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in: Surface and interface analysis, Jahrgang 48.2016, Nr. 7, 30.03.2016, S. 570-574.
Publikationen: Beitrag in Fachzeitschrift › Artikel › Forschung › (peer-reviewed)
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TY - JOUR
T1 - Analysis of the thermal and temporal stability of Ta and Ti thin films onto SAW–substrate materials (LiNbO3 and LiTaO3) using AR-XPS
AU - Vogel, U.
AU - Gemming, Thomas
AU - Eckert, Jürgen
AU - Oswald, Stefan
PY - 2016/3/30
Y1 - 2016/3/30
KW - ARXPS
KW - LiNbO
KW - LiTaO
KW - SAW
KW - stability
KW - tantalum deposition
KW - titanium deposition
UR - http://www.scopus.com/inward/record.url?scp=84962756730&partnerID=8YFLogxK
U2 - 10.1002/sia.6006
DO - 10.1002/sia.6006
M3 - Article
AN - SCOPUS:84962756730
VL - 48.2016
SP - 570
EP - 574
JO - Surface and interface analysis
JF - Surface and interface analysis
SN - 0142-2421
IS - 7
ER -