UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Research output: Contribution to conferencePosterResearchpeer-review

Authors

  • Thomas Höfler
  • B. Basnar
  • J. Cirac
  • Helmuth Hoffmann
  • J. Kovac
  • Michael Ramsey
  • A. Satka
  • Susanne Temmel
  • Anna Track
  • Gregor Trimmel
  • Egbert Zojer

Details

Translated title of the contributionUV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.
Original languageGerman
Publication statusPublished - 2007
EventMaterials Research Society Fall Meeting 2007 - Boston, United States
Duration: 26 Nov 200730 Nov 2007

Conference

ConferenceMaterials Research Society Fall Meeting 2007
Country/TerritoryUnited States
CityBoston
Period26/11/0730/11/07