Thermally-induced stresses in thin aluminum layers grown on silicon
Research output: Contribution to journal › Article › Research › peer-review
Standard
Thermally-induced stresses in thin aluminum layers grown on silicon. / Eiper, Ernst; Resel, R.; Eisenmenger-Sittner, C. et al.
In: Powder diffraction, 2004, p. 74-76.
In: Powder diffraction, 2004, p. 74-76.
Research output: Contribution to journal › Article › Research › peer-review
Harvard
Eiper, E, Resel, R, Eisenmenger-Sittner, C, Hafok, M & Keckes, J 2004, 'Thermally-induced stresses in thin aluminum layers grown on silicon', Powder diffraction, pp. 74-76.
APA
Eiper, E., Resel, R., Eisenmenger-Sittner, C., Hafok, M., & Keckes, J. (2004). Thermally-induced stresses in thin aluminum layers grown on silicon. Powder diffraction, 74-76.
Vancouver
Eiper E, Resel R, Eisenmenger-Sittner C, Hafok M, Keckes J. Thermally-induced stresses in thin aluminum layers grown on silicon. Powder diffraction. 2004;74-76.
Author
Bibtex - Download
@article{6f841d30f0704ffd8fd2503160ef80c6,
title = "Thermally-induced stresses in thin aluminum layers grown on silicon",
author = "Ernst Eiper and R. Resel and C. Eisenmenger-Sittner and M. Hafok and Jozef Keckes",
year = "2004",
language = "English",
pages = "74--76",
journal = "Powder diffraction",
issn = "0885-7156",
publisher = "Cambridge University Press",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Thermally-induced stresses in thin aluminum layers grown on silicon
AU - Eiper, Ernst
AU - Resel, R.
AU - Eisenmenger-Sittner, C.
AU - Hafok, M.
AU - Keckes, Jozef
PY - 2004
Y1 - 2004
M3 - Article
SP - 74
EP - 76
JO - Powder diffraction
JF - Powder diffraction
SN - 0885-7156
ER -
