SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE
Research output: Contribution to conference › Poster › Research › peer-review
Standard
SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE. / Lorbek, Stefan; Hlawacek, Gregor; Teichert, Christian.
2010. Poster session presented at International Workshop on In situ characterization of near-surface processes, Eisenerz, Austria.
2010. Poster session presented at International Workshop on In situ characterization of near-surface processes, Eisenerz, Austria.
Research output: Contribution to conference › Poster › Research › peer-review
Harvard
Lorbek, S, Hlawacek, G & Teichert, C 2010, 'SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE', International Workshop on In situ characterization of near-surface processes, Eisenerz, Austria, 30/05/10 - 3/06/10.
APA
Lorbek, S., Hlawacek, G., & Teichert, C. (2010). SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE. Poster session presented at International Workshop on In situ characterization of near-surface processes, Eisenerz, Austria.
Vancouver
Lorbek S, Hlawacek G, Teichert C. SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE. 2010. Poster session presented at International Workshop on In situ characterization of near-surface processes, Eisenerz, Austria.
Author
Bibtex - Download
@conference{71f731b3fbc5420c827888cdf99e08b6,
title = "SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE",
author = "Stefan Lorbek and Gregor Hlawacek and Christian Teichert",
year = "2010",
language = "English",
note = "International Workshop on In situ characterization of near-surface processes ; Conference date: 30-05-2010 Through 03-06-2010",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE
AU - Lorbek, Stefan
AU - Hlawacek, Gregor
AU - Teichert, Christian
PY - 2010
Y1 - 2010
M3 - Poster
T2 - International Workshop on In situ characterization of near-surface processes
Y2 - 30 May 2010 through 3 June 2010
ER -
