Photolithographic Micro-patterning of Polymers for Optical Applications

Research output: ThesisMaster's Thesis

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Photolithographic Micro-patterning of Polymers for Optical Applications. / Köpplmayr, Thomas.
2010. 107 p.

Research output: ThesisMaster's Thesis

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Köpplmayr, T. (2010). Photolithographic Micro-patterning of Polymers for Optical Applications. [Master's Thesis, Montanuniversitaet Leoben (000)].

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@mastersthesis{9258c7c0893c4fb3810fd867805683f5,
title = "Photolithographic Micro-patterning of Polymers for Optical Applications",
abstract = "This work deals with the synthesis and characterization of photoreactive polymers and their potential application in optics and opto-electronics. First, polymers bearing phenyl or naphthyl ester groups are investigated. These polymers are easily accessible by polymer analogous esterification of commercially available poly(4-vinylphenol). Both polymers, poly(4-vinylphenyl benzoate) (PVP-BZ) and poly(4-vinylphenyl 1-naphthoate) (PVP-NA), undergo a Fries rearrangement upon exposure to UV light. This leads to a change in the refractive index up to Δn = +0.036. Refractive index patterns can be generated using photolithographic techniques as shown by optical microscopy using a phase contrast set-up for visualization. Patterned films of PVP-BZ and PVP-NA with a resolution of 1 μm are obtained by the use of a mask aligner. The formation of hydroxyl ketone groups upon UV irradiation also provides the opportunity of selective post-exposure reactions, including the immobilization of different fluorescent dyes in the illuminated areas. In combination with lithographic processes fluorescence patterns with bright luminescence are obtained. The difference in UV absorbance of these polymers can be employed for the design of a dual-layer assembly. This allows selective patterning of each layer by the choice of the specified wavelength. Thus, these materials are of interest for multi-layer optical data storage applications. In addition, (±)endo,exo-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylicbis-(4-thiocyanatomethyl)benzylester is synthesized and polymerized via ring-opening metathesis polymerization (ROMP). The attached SCN-groups undergo a conversion to NCS-groups upon UV irradiation. This provides the possibility of selective surface functionalization by physical mixing with a fluorene-based electroluminescent polymer followed by photolithographic patterning and post-modification with a fluorescent dye. Due to F{\"o}rster resonance energy transfer (FRET), tuning of the emission color can be achieved.",
keywords = "Polymer-Photochemie, Photolithographie, Oberfl{\"a}chen-Funktionalisierung, Optische Datenspeicherung, Organische Leuchtdiode (OLED), polymer photochemistry, photolithography, surface functionalization, optical data storage, organic light emitting diode (OLED)",
author = "Thomas K{\"o}pplmayr",
note = "embargoed until null",
year = "2010",
language = "English",
school = "Montanuniversitaet Leoben (000)",

}

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TY - THES

T1 - Photolithographic Micro-patterning of Polymers for Optical Applications

AU - Köpplmayr, Thomas

N1 - embargoed until null

PY - 2010

Y1 - 2010

N2 - This work deals with the synthesis and characterization of photoreactive polymers and their potential application in optics and opto-electronics. First, polymers bearing phenyl or naphthyl ester groups are investigated. These polymers are easily accessible by polymer analogous esterification of commercially available poly(4-vinylphenol). Both polymers, poly(4-vinylphenyl benzoate) (PVP-BZ) and poly(4-vinylphenyl 1-naphthoate) (PVP-NA), undergo a Fries rearrangement upon exposure to UV light. This leads to a change in the refractive index up to Δn = +0.036. Refractive index patterns can be generated using photolithographic techniques as shown by optical microscopy using a phase contrast set-up for visualization. Patterned films of PVP-BZ and PVP-NA with a resolution of 1 μm are obtained by the use of a mask aligner. The formation of hydroxyl ketone groups upon UV irradiation also provides the opportunity of selective post-exposure reactions, including the immobilization of different fluorescent dyes in the illuminated areas. In combination with lithographic processes fluorescence patterns with bright luminescence are obtained. The difference in UV absorbance of these polymers can be employed for the design of a dual-layer assembly. This allows selective patterning of each layer by the choice of the specified wavelength. Thus, these materials are of interest for multi-layer optical data storage applications. In addition, (±)endo,exo-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylicbis-(4-thiocyanatomethyl)benzylester is synthesized and polymerized via ring-opening metathesis polymerization (ROMP). The attached SCN-groups undergo a conversion to NCS-groups upon UV irradiation. This provides the possibility of selective surface functionalization by physical mixing with a fluorene-based electroluminescent polymer followed by photolithographic patterning and post-modification with a fluorescent dye. Due to Förster resonance energy transfer (FRET), tuning of the emission color can be achieved.

AB - This work deals with the synthesis and characterization of photoreactive polymers and their potential application in optics and opto-electronics. First, polymers bearing phenyl or naphthyl ester groups are investigated. These polymers are easily accessible by polymer analogous esterification of commercially available poly(4-vinylphenol). Both polymers, poly(4-vinylphenyl benzoate) (PVP-BZ) and poly(4-vinylphenyl 1-naphthoate) (PVP-NA), undergo a Fries rearrangement upon exposure to UV light. This leads to a change in the refractive index up to Δn = +0.036. Refractive index patterns can be generated using photolithographic techniques as shown by optical microscopy using a phase contrast set-up for visualization. Patterned films of PVP-BZ and PVP-NA with a resolution of 1 μm are obtained by the use of a mask aligner. The formation of hydroxyl ketone groups upon UV irradiation also provides the opportunity of selective post-exposure reactions, including the immobilization of different fluorescent dyes in the illuminated areas. In combination with lithographic processes fluorescence patterns with bright luminescence are obtained. The difference in UV absorbance of these polymers can be employed for the design of a dual-layer assembly. This allows selective patterning of each layer by the choice of the specified wavelength. Thus, these materials are of interest for multi-layer optical data storage applications. In addition, (±)endo,exo-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylicbis-(4-thiocyanatomethyl)benzylester is synthesized and polymerized via ring-opening metathesis polymerization (ROMP). The attached SCN-groups undergo a conversion to NCS-groups upon UV irradiation. This provides the possibility of selective surface functionalization by physical mixing with a fluorene-based electroluminescent polymer followed by photolithographic patterning and post-modification with a fluorescent dye. Due to Förster resonance energy transfer (FRET), tuning of the emission color can be achieved.

KW - Polymer-Photochemie

KW - Photolithographie

KW - Oberflächen-Funktionalisierung

KW - Optische Datenspeicherung

KW - Organische Leuchtdiode (OLED)

KW - polymer photochemistry

KW - photolithography

KW - surface functionalization

KW - optical data storage

KW - organic light emitting diode (OLED)

M3 - Master's Thesis

ER -