Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films
Research output: Contribution to conference › Poster › Research › peer-review
Standard
Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. / Muhr, Nina; Grießer, Thomas; Kern, Wolfgang.
2010. Poster session presented at ASPM, Leoben, Austria.
2010. Poster session presented at ASPM, Leoben, Austria.
Research output: Contribution to conference › Poster › Research › peer-review
Harvard
Muhr, N, Grießer, T & Kern, W 2010, 'Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films', ASPM, Leoben, Austria, 8/09/10 - 10/09/10.
APA
Muhr, N., Grießer, T., & Kern, W. (2010). Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. Poster session presented at ASPM, Leoben, Austria.
Vancouver
Muhr N, Grießer T, Kern W. Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. 2010. Poster session presented at ASPM, Leoben, Austria.
Author
Bibtex - Download
@conference{7e36bd154a894ebaa5a1c7da3d1264b3,
title = "Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films",
author = "Nina Muhr and Thomas Grie{\ss}er and Wolfgang Kern",
year = "2010",
language = "English",
note = "ASPM ; Conference date: 08-09-2010 Through 10-09-2010",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films
AU - Muhr, Nina
AU - Grießer, Thomas
AU - Kern, Wolfgang
PY - 2010
Y1 - 2010
M3 - Poster
T2 - ASPM
Y2 - 8 September 2010 through 10 September 2010
ER -
