Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Standard
Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. / Muhr, Nina; Grießer, Thomas; Kern, Wolfgang.
2010. Postersitzung präsentiert bei 10th Austrian Polymer Meeting and 2nd Joint Austrian-Slovenian Polymer Meeting 2010, Leoben, Österreich.
2010. Postersitzung präsentiert bei 10th Austrian Polymer Meeting and 2nd Joint Austrian-Slovenian Polymer Meeting 2010, Leoben, Österreich.
Publikationen: Konferenzbeitrag › Poster › Forschung › (peer-reviewed)
Harvard
Muhr, N, Grießer, T & Kern, W 2010, 'Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films', 10th Austrian Polymer Meeting and 2nd Joint Austrian-Slovenian Polymer Meeting 2010, Leoben, Österreich, 8/09/10 - 10/09/10.
APA
Muhr, N., Grießer, T., & Kern, W. (2010). Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. Postersitzung präsentiert bei 10th Austrian Polymer Meeting and 2nd Joint Austrian-Slovenian Polymer Meeting 2010, Leoben, Österreich.
Vancouver
Muhr N, Grießer T, Kern W. Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films. 2010. Postersitzung präsentiert bei 10th Austrian Polymer Meeting and 2nd Joint Austrian-Slovenian Polymer Meeting 2010, Leoben, Österreich.
Author
Bibtex - Download
@conference{7e36bd154a894ebaa5a1c7da3d1264b3,
title = "Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films",
author = "Nina Muhr and Thomas Grie{\ss}er and Wolfgang Kern",
year = "2010",
language = "English",
note = "ASPM ; Conference date: 08-09-2010 Through 10-09-2010",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Patterned immobilisation of silicon dioxide nanoparticles on photo sensitive polymer films
AU - Muhr, Nina
AU - Grießer, Thomas
AU - Kern, Wolfgang
PY - 2010
Y1 - 2010
M3 - Poster
T2 - ASPM
Y2 - 8 September 2010 through 10 September 2010
ER -
