Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures

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Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures. / Rebelo De Figueiredo, Marisa; Abad, Manuel D.; Harris, Adrian J. et al.
In: Thin solid films, Vol. 578, 2015, p. 20-24.

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Rebelo De Figueiredo M, Abad MD, Harris AJ, Czettl C, Mitterer C, Hosemann P. Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures. Thin solid films. 2015;578:20-24. doi: 10.1016/j.tsf.2015.01.069

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@article{7b09d69e67b24d5a8fd7cba9d83fbca1,
title = "Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures",
author = "{Rebelo De Figueiredo}, Marisa and Abad, {Manuel D.} and Harris, {Adrian J.} and Christoph Czettl and Christian Mitterer and Peter Hosemann",
year = "2015",
doi = "10.1016/j.tsf.2015.01.069",
language = "English",
volume = "578",
pages = "20--24",
journal = "Thin solid films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Nanoindentation of chemical-vapor deposited Al2O3 hard coatings at elevated temperatures

AU - Rebelo De Figueiredo, Marisa

AU - Abad, Manuel D.

AU - Harris, Adrian J.

AU - Czettl, Christoph

AU - Mitterer, Christian

AU - Hosemann, Peter

PY - 2015

Y1 - 2015

U2 - 10.1016/j.tsf.2015.01.069

DO - 10.1016/j.tsf.2015.01.069

M3 - Article

VL - 578

SP - 20

EP - 24

JO - Thin solid films

JF - Thin solid films

SN - 0040-6090

ER -