Microstructure-property relations of reactively magnetron sputtered VCxNy films
Research output: Contribution to journal › Article › Research › peer-review
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Microstructure-property relations of reactively magnetron sputtered VCxNy films. / Mitterer, Christian; Fateh, Nazanin; Munnik, F.
In: Surface & coatings technology, 2011, p. 3805-3809.
In: Surface & coatings technology, 2011, p. 3805-3809.
Research output: Contribution to journal › Article › Research › peer-review
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Mitterer C, Fateh N, Munnik F. Microstructure-property relations of reactively magnetron sputtered VCxNy films. Surface & coatings technology. 2011;3805-3809. doi: 10.1016/j.surfcoat.2011.01.037
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Bibtex - Download
@article{d3f483b22d394a95a17d2aa3c2b3d120,
title = "Microstructure-property relations of reactively magnetron sputtered VCxNy films",
author = "Christian Mitterer and Nazanin Fateh and F. Munnik",
year = "2011",
doi = "10.1016/j.surfcoat.2011.01.037",
language = "English",
pages = "3805--3809",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Microstructure-property relations of reactively magnetron sputtered VCxNy films
AU - Mitterer, Christian
AU - Fateh, Nazanin
AU - Munnik, F.
PY - 2011
Y1 - 2011
U2 - 10.1016/j.surfcoat.2011.01.037
DO - 10.1016/j.surfcoat.2011.01.037
M3 - Article
SP - 3805
EP - 3809
JO - Surface & coatings technology
JF - Surface & coatings technology
SN - 0257-8972
ER -
