Influence of reactive gas flow ratio during sputter deposition of Mo-O-N thin films on their structure and properties

Research output: ThesisMaster's Thesis

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@mastersthesis{e1924a4cb2d24e7e9e99a81dc8b13bbf,
title = "Influence of reactive gas flow ratio during sputter deposition of Mo-O-N thin films on their structure and properties",
abstract = "Functional transition metal oxynitrides (Me-O-N) are emerging materials that are known for their tunable and often enhanced physical properties compared to conventional oxides. As, however, relatively little is known about the Mo-O-N system, this study illuminates the influence of N on the microstructure as well as the mechanical, optical and electrical properties. Mo-O-N films were grown by DC reactive magnetron sputter deposition at different reactive gas flow N2/(O2+N2) ratios. The films change with increasing fraction of N, from an amorphous, transparent and non-conductive with inferior mechanical properties to crystalline, metal-like conductive and hard. Additionally, the film thickness affects the optical and electrical properties.",
keywords = "Mo-O-N system, thin films, DC reactive magnetron sputtering, microstructure, mechanical properties, optical properties, electrical properties, Mo-O-N System, d{\"u}nne Schichten, DC Magnetron-Sputtern, Mikrostruktur, mechanische Eigenschaften, optische Eigenschaften, elektrische Eigenschaften",
author = "Thadd{\"a}a Rath",
note = "no embargo",
year = "2018",
language = "English",
school = "Montanuniversitaet Leoben (000)",

}

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TY - THES

T1 - Influence of reactive gas flow ratio during sputter deposition of Mo-O-N thin films on their structure and properties

AU - Rath, Thaddäa

N1 - no embargo

PY - 2018

Y1 - 2018

N2 - Functional transition metal oxynitrides (Me-O-N) are emerging materials that are known for their tunable and often enhanced physical properties compared to conventional oxides. As, however, relatively little is known about the Mo-O-N system, this study illuminates the influence of N on the microstructure as well as the mechanical, optical and electrical properties. Mo-O-N films were grown by DC reactive magnetron sputter deposition at different reactive gas flow N2/(O2+N2) ratios. The films change with increasing fraction of N, from an amorphous, transparent and non-conductive with inferior mechanical properties to crystalline, metal-like conductive and hard. Additionally, the film thickness affects the optical and electrical properties.

AB - Functional transition metal oxynitrides (Me-O-N) are emerging materials that are known for their tunable and often enhanced physical properties compared to conventional oxides. As, however, relatively little is known about the Mo-O-N system, this study illuminates the influence of N on the microstructure as well as the mechanical, optical and electrical properties. Mo-O-N films were grown by DC reactive magnetron sputter deposition at different reactive gas flow N2/(O2+N2) ratios. The films change with increasing fraction of N, from an amorphous, transparent and non-conductive with inferior mechanical properties to crystalline, metal-like conductive and hard. Additionally, the film thickness affects the optical and electrical properties.

KW - Mo-O-N system

KW - thin films

KW - DC reactive magnetron sputtering

KW - microstructure

KW - mechanical properties

KW - optical properties

KW - electrical properties

KW - Mo-O-N System

KW - dünne Schichten

KW - DC Magnetron-Sputtern

KW - Mikrostruktur

KW - mechanische Eigenschaften

KW - optische Eigenschaften

KW - elektrische Eigenschaften

M3 - Master's Thesis

ER -