Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films

Research output: Contribution to journalArticleResearchpeer-review

Standard

Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films. / Moser, Martin; Mayrhofer, Paul Heinz; Székely, L et al.
In: Surface & coatings technology, Vol. 203, 2008, p. 148-155.

Research output: Contribution to journalArticleResearchpeer-review

Bibtex - Download

@article{0ecf1d361d31490ca226acca5daa7e17,
title = "Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films",
author = "Martin Moser and Mayrhofer, {Paul Heinz} and L Sz{\'e}kely and G S{\'a}fr{\'a}n and P.B. Barna",
year = "2008",
language = "English",
volume = "203",
pages = "148--155",
journal = "Surface & coatings technology",
issn = "0257-8972",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films

AU - Moser, Martin

AU - Mayrhofer, Paul Heinz

AU - Székely, L

AU - Sáfrán, G

AU - Barna, P.B.

PY - 2008

Y1 - 2008

M3 - Article

VL - 203

SP - 148

EP - 155

JO - Surface & coatings technology

JF - Surface & coatings technology

SN - 0257-8972

ER -