Growth morphologies for the deposition of Para-hexaphenyl molecules on amorphous substrates
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2021.
Research output: Thesis › Doctoral Thesis
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TY - BOOK
T1 - Growth morphologies for the deposition of Para-hexaphenyl molecules on amorphous substrates
AU - Lorbek, Stefan
N1 - embargoed until null
PY - 2021
Y1 - 2021
N2 - There is already a large variety of applications on the consumer market made of thin films of organic semiconducting materials. Therefore, it is crucial to understand the formation mechanisms of such organic films. Here, thin films of the aromatic rod-like molecule Para-hexaphenyl (6P) were grown by organic molecular beam epitaxy under ultra-high vacuum conditions. For these experiments, Ar+-bombarded mica and silicon dioxide (SiO2) were used as amorphous substrates. 6P tends to build mounds of nearly upright standing molecules on this kind of substrates. The growth morphology of these thin films was investigated by various ex- and in-situ atomic force microscopy techniques (AFM). One important parameter in nucleation of thin-film growth is the critical nucleus size i*. The analysis of the experiments reveals that the calculated values for i* from rate theory, island-size scaling, and capture-zone scaling (using the generalized Wigner surmise) are in good agreement with each other. 6P on ion-bombarded mica and on SiO2 can exhibit a post-nucleation with a dewetting by virtue of the exposure to air, most probably because of water co-adsorption. After growth, short annealing of 5 to 10 minutes up to a substrate temperature of 423 K was applied to the 6P thin films. AFM phase mode investigations yield that islands shrink, but something remains or changes the surface at the position of the former islands. Kelvin probe force microscopy reveals a change in the contact potential difference at these positions in comparison with positions at remaining 6P islands or pure SiO2. Further, 6P was deposited under a grazing incidence at angles between 70° and 85° with respect to the substrate's surface normal. Steering effects, which are present in inorganic growth under grazing incidence, were not observed for organic thin films of 6P on SiO2. However, there is an evidence of a slight change in the fractal dimension of the resulting 6P islands. Finally, the nucleation of elongated hexagonal islands in subsequent layers was investigated by AFM and simulations using empirical force-fields (EFF) together with molecular dynamics (MD) simulations were performed. The preferable inner angles of the hexagonal islands are (104±2)° and (126±2)°. EFF simulations result in an octagonal structure as an equilibrium shape of the 6P single crystal and MD simulations explain the formation of a hexagonal structure because the 6P molecules have a higher sticking probability at the [10] facet.
AB - There is already a large variety of applications on the consumer market made of thin films of organic semiconducting materials. Therefore, it is crucial to understand the formation mechanisms of such organic films. Here, thin films of the aromatic rod-like molecule Para-hexaphenyl (6P) were grown by organic molecular beam epitaxy under ultra-high vacuum conditions. For these experiments, Ar+-bombarded mica and silicon dioxide (SiO2) were used as amorphous substrates. 6P tends to build mounds of nearly upright standing molecules on this kind of substrates. The growth morphology of these thin films was investigated by various ex- and in-situ atomic force microscopy techniques (AFM). One important parameter in nucleation of thin-film growth is the critical nucleus size i*. The analysis of the experiments reveals that the calculated values for i* from rate theory, island-size scaling, and capture-zone scaling (using the generalized Wigner surmise) are in good agreement with each other. 6P on ion-bombarded mica and on SiO2 can exhibit a post-nucleation with a dewetting by virtue of the exposure to air, most probably because of water co-adsorption. After growth, short annealing of 5 to 10 minutes up to a substrate temperature of 423 K was applied to the 6P thin films. AFM phase mode investigations yield that islands shrink, but something remains or changes the surface at the position of the former islands. Kelvin probe force microscopy reveals a change in the contact potential difference at these positions in comparison with positions at remaining 6P islands or pure SiO2. Further, 6P was deposited under a grazing incidence at angles between 70° and 85° with respect to the substrate's surface normal. Steering effects, which are present in inorganic growth under grazing incidence, were not observed for organic thin films of 6P on SiO2. However, there is an evidence of a slight change in the fractal dimension of the resulting 6P islands. Finally, the nucleation of elongated hexagonal islands in subsequent layers was investigated by AFM and simulations using empirical force-fields (EFF) together with molecular dynamics (MD) simulations were performed. The preferable inner angles of the hexagonal islands are (104±2)° and (126±2)°. EFF simulations result in an octagonal structure as an equilibrium shape of the 6P single crystal and MD simulations explain the formation of a hexagonal structure because the 6P molecules have a higher sticking probability at the [10] facet.
KW - organisches Dünnfilmwachstum
KW - organische dünne Filme
KW - aufrechtstehende Moleküle
KW - 6P
KW - p6P
KW - para-Hexaphenyl
KW - para-Sexiphenyl
KW - Hexaphenyl
KW - Sexiphenyl
KW - AFM
KW - Rasterkraftmikroskopie
KW - FFM
KW - Reibungskraftmikroskopie
KW - TSM
KW - Querscherungsmikroskopie
KW - KPFM
KW - Kelvinsonden Rasterkraftmikroskopie
KW - Kontaktpotenzialdifferenz
KW - CPD
KW - Siliziumdioxid
KW - Siliziumoxid
KW - amorphe Substrate
KW - Glimmer
KW - Ionen-beschossener Glimmer
KW - Bariumfluorid
KW - Bariumdifluorid
KW - kritische Keimgröße
KW - kritische Inselgröße
KW - i
KW - organischeMolekülstrahlepitaxie
KW - OMBE
KW - Ratentheorie
KW - Ratenverteilung
KW - Inselgrößenverteilung
KW - Einfangzonenverteilung
KW - verallgemeinerteWigner Vermutung
KW - Aufdampfrate
KW - bimodale Inselgrößenverteilung
KW - bimodales Wachstum
KW - Ablenkungseffekt
KW - streifender Einfall
KW - sechseckig geformte Inseln
KW - UHV
KW - Ultrahochvakuum
KW - Ehrlich-Schwoebel Barriere
KW - Keimbildung
KW - Normierungstheorie
KW - Voronoi-Diagramm
KW - Dirichlet-Zerlegung
KW - Einfangzone
KW - diffusionsbegrenztes Wachstum
KW - DLA
KW - anlagerungsbegrenztesWachstum
KW - ALA
KW - kompakte Insel
KW - dendritische Insel
KW - fraktaleInsel
KW - fraktale Dimension
KW - Monte Carlo Simulation
KW - Energiefeldersimulation
KW - Moleküldynamiksimulation
KW - organischeHalbleitermoleküle
KW - organischer Halbleiter
KW - Muskovit
KW - Heliumionenmikroskop
KW - HIM
KW - Ausheilen
KW - Plasmaätzen
KW - natürlichgewachsenes Siliziumoxid
KW - thermisch gewachsenes Siliziumoxid
KW - hot-precursor Zustand
KW - heißer Präkursorzustand
KW - organic thin-film growth
KW - organic thin films
KW - upright standing molecules
KW - 6P
KW - p6P
KW - para-hexaphenyl
KW - para-sexiphenyl
KW - hexaphenyl
KW - sexiphenyl
KW - AFM
KW - atomic force microscopy
KW - FFM
KW - friction force microscopy
KW - TSM
KW - transverse shear microscopy
KW - KPFM
KW - Kelvin probe force microscopy
KW - contact potential difference
KW - CPD
KW - silicon dioxide
KW - SiO2
KW - amorphous substrates
KW - mica
KW - ion-bombarded mica
KW - barium flouride
KW - BaF2
KW - critical nucleus size
KW - critical island size
KW - i
KW - organic molecular beam epitaxy
KW - OMBE
KW - rate theory
KW - rate equation
KW - island-size distribution
KW - capture-zone distribution
KW - generalized Wigner surmise
KW - deposition rate
KW - bimodal island-size distribution
KW - bimodal growth
KW - steering effect
KW - grazing incidence
KW - hexagonal shaped islands
KW - UHV
KW - ultra-high vacuum
KW - Ehrlich-Schwoebel barrier
KW - nucleation
KW - scaling theory
KW - Voronoi tessellation
KW - capture zone
KW - diffusion-limited aggregation
KW - DLA
KW - attachment-limited aggregation
KW - ALA
KW - compact island
KW - dendritic island
KW - fractal island
KW - fractal dimension
KW - Monte Carlo simulation
KW - energy-fields simulation
KW - molecular dynamics simulation
KW - organic semiconducting molecules
KW - organic semiconductor
KW - muscovite mica
KW - helium ion microscopy
KW - HIM
KW - annealing
KW - plasma etching
KW - native silicon dioxide
KW - thermally grown silicon dioxide
KW - hot-precursor state
M3 - Doctoral Thesis
ER -