Chemical sensitivity on patterned organic thin films by FFM
Research output: Contribution to conference › Poster › Research › peer-review
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Chemical sensitivity on patterned organic thin films by FFM. / Shen, Quan; Hlawacek, Gregor; Teichert, Christian et al.
2007. Poster session presented at ÖPG 2007, Krems, Austria.
2007. Poster session presented at ÖPG 2007, Krems, Austria.
Research output: Contribution to conference › Poster › Research › peer-review
Harvard
Shen, Q, Hlawacek, G, Teichert, C, Lex, A, Trimmel, G & Kern, W 2007, 'Chemical sensitivity on patterned organic thin films by FFM', ÖPG 2007, Krems, Austria, 24/09/07 - 29/09/07.
APA
Shen, Q., Hlawacek, G., Teichert, C., Lex, A., Trimmel, G., & Kern, W. (2007). Chemical sensitivity on patterned organic thin films by FFM. Poster session presented at ÖPG 2007, Krems, Austria.
Vancouver
Shen Q, Hlawacek G, Teichert C, Lex A, Trimmel G, Kern W. Chemical sensitivity on patterned organic thin films by FFM. 2007. Poster session presented at ÖPG 2007, Krems, Austria.
Author
Bibtex - Download
@conference{a64c44a36d9a466ea755e4782304da0f,
title = "Chemical sensitivity on patterned organic thin films by FFM",
author = "Quan Shen and Gregor Hlawacek and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",
year = "2007",
language = "English",
note = "{\"O}PG 2007 ; Conference date: 24-09-2007 Through 29-09-2007",
}
RIS (suitable for import to EndNote) - Download
TY - CONF
T1 - Chemical sensitivity on patterned organic thin films by FFM
AU - Shen, Quan
AU - Hlawacek, Gregor
AU - Teichert, Christian
AU - Lex, Alexandra
AU - Trimmel, Gregor
AU - Kern, Wolfgang
PY - 2007
Y1 - 2007
M3 - Poster
T2 - ÖPG 2007
Y2 - 24 September 2007 through 29 September 2007
ER -
