C2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings

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Translated title of the contributionC2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings
Original languageEnglish
Pages (from-to)127-132
JournalSurface & coatings technology
Volume215
DOIs
Publication statusPublished - 2013