C2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings
Research output: Contribution to journal › Article › Research › peer-review
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| Translated title of the contribution | C2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings |
|---|---|
| Original language | English |
| Pages (from-to) | 127-132 |
| Journal | Surface & coatings technology |
| Volume | 215 |
| DOIs | |
| Publication status | Published - 2013 |
