C2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings
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Translated title of the contribution | C2H6 as precursor for low pressure chemical vapor deposition of TiCNB hard coatings |
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Original language | English |
Pages (from-to) | 127-132 |
Journal | Surface & coatings technology |
Volume | 215 |
DOIs | |
Publication status | Published - 2013 |